Hafnium Metal Hf 99.99% High Purity for Semiconductor Films, Sputtering Targets and Electron Beam Evaporation
4.0InStock Auditedby Shanghai Sheeny Metal Mateirals Co., Ltd.
₹2,75,550≈ $3,300 · indicative, confirm with supplier
Specifications
| CAS No | 7440-58-6 |
| Density | 13.31 G/cm³ |
| EINECS No | 231-166-4 |
| Model NO. | ET-HfM-02 |
| Product name | Hafnium Metal |
Description
Hafnium Metal Hf 99.99% High Purity for Semiconductor Films, Sputtering Targets and Electron Beam Evaporation. 99.99% High Purity. High Purity Hafnium Source. Suitable for Sputtering Targets. Suitable for Electron Beam Evaporation. Suitable for Hafnium Based Films.
Shanghai Sheeny Metal Mateirals Co., Ltd.
Shanghai, China
Audited supplier
Verified license
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